Electrochemical deposition
Electrochemical deposition is generally used for the growth of metals and conducting metal oxides because of the following advantages: (i) the thickness and morphology of the nano-structure can be precisely controlled by adjusting the electrochemical parameters, (ii) relatively uniform and compact deposits can be synthesized in template-based structures, (iii) higher deposition rates are obtained, and (iv) the equipment is inexpensive due to the non-requirements of either a high vacuum or a high reaction temperature.
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